Gallium Nitride Epitaxy System for Power Transistors TM 200-01

Gallium Nitride Epitaxy System TM 200-01 for Power Transistors Production

Manufacturer: NIITM OJSC
Price: Request Quote

Bulk pricing available

FOB, CIF & EXW terms available

Description

Gallium Nitride MOS-HYDRID EPITAXATION INSTALLATION ON SUBstrates with a diameter up to 200 mm for the production of power transistors

Specifications

Length
1300 mm
Width
4150 mm
Performance
Up to 2000 epitaxial growth processes of transistor structures per year.
Substrate holder heating temperature
1150 °C
Dimensions
4150x1300x2850 mm
Plate diameter
200 mm
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Delivery & Payment

Shipping Terms

FOB Novorossiysk, Russia CIF Available to major ports worldwide EXW Manufacturer's facility, Russia

Delivery Time

Sea freight: 30-60 days (depending on destination) Air freight: 14-21 days (for urgent orders)

Payment Methods

Letter of Credit (L/C) Wire Transfer (T/T) Escrow Services

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