
Gallium Nitride Epitaxy System TM 200-01 for Power Transistors Production
Manufacturer:
NIITM OJSC
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Description
Gallium Nitride MOS-HYDRID EPITAXATION INSTALLATION ON SUBstrates with a diameter up to 200 mm for the production of power transistors
Specifications
Length
1300 mm
Width
4150 mm
Performance
Up to 2000 epitaxial growth processes of transistor structures per year.
Substrate holder heating temperature
1150 °C
Dimensions
4150x1300x2850 mm
Plate diameter
200 mm
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Delivery Time
Sea freight: 30-60 days (depending on destination)
Air freight: 14-21 days (for urgent orders)
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