
Ion Source II-145 for Ion Beam Applications - Versatile Ion Generation
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FOB, CIF & EXW terms available
Description
Ion source ??-145 is designed for generation of linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion modification of surface, assisted sputtering.
Operation Manual is available on request: LCMK.247.00.00.00.00.000 RE ION SOURCE II-145.
Specifications
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