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Molecular Layer Deposition System UМН-4П/Д150 for Functional Nanocoating Applications
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Description
Molecular layering (Atomic Layer Deposition, ALD) unit is designed for layering of functional, canfor nanocoatings with thickness from 1nm on substrates from various materials. The nanocoatings can be oxides, nitrides, fluorides, fulphides, etc. The nanocoatings can be oxides, nitrides, fluorides, etc. Fields of application: -microelectronics; -nanoelectronics; -sensor instrumentation; -solar energy; -sorption-catalytic processes; -membrane technologies; -creation of renewable energy sources; -medicine.
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