Plasma Radiofrequency Generator RPG-128 for Continuous Low-Temperature Plasma Applications

The electrodeless radio-frequency plasma generator is designed for creation and maintenance of gas-discharge low-temperature plasma in working volumes of vacuum technological installations in continuous mode and is used at: <ul> <li>- material sputtering in plasma of inert or chemically active gases</li> <li>ion and plasma chemical etching</li> <li>evaporation, with additional vapour ionisation</li> <li>plasma-stimulated vapour deposition</li> <li>ionic surface modification (oxidation, reduction, nitriding, carbidisation)</li> <li>ionic cleaning and assisted</li> <li>high-temperature annealing</li> </ul> The RPG-128 is equipped with: <ul> <li>- flat coil</li> <li>removable quartz glass shield to protect the working surface</li> <li>coaxial input with shank for connection of RF power source</li> </ul> *Operational Manual is available on request: LCMK.219.00.00.00.00.000-02 RE Radiofrequency PLASMA GENERATOR RPG-128 It is allowed to deliver the device as a part of the installation without packing.