Vacuum film application machine by magnetron MAGNA TM

The processing of plates in one technological cycle:
60x48 mm - 19 pcs, Ø 76 mm - 13 pcs, Ø 100 mm - 7 pcs,
Ø 150 mm - 3 pieces, Ø 200 mm - 1 piece, Ø 300 mm - 1 piece;
Sluice chamber for loading - unloading of substrates on the carrier
from cassette to cassette;
Transport system for transfer of wafers on the carrier from the airlock chamber
to the working chamber on the basis of a manipulator;
Heated RF table;
Multicathode MRU with three targets Ø 150 mm;
Application of a single film from three magnetrons or sequential application of two, three-layer films using a flap;
Oil-free pumping system;
Consumption power not more than 16 kW;
Possibility to build in a clean room.