Thin Film Deposition System - Magnetron & Ion Beam Technology

Thin Film Deposition System for Metals, Alloys, and Dielectrics - Advanced Application

Manufacturer:ESTO OJSC
Price:Request Quote

Bulk pricing available

FOB, CIF & EXW terms available

Description

Realised application technologies: -magnetron application of thin films: -metals, resistive alloys, other conductive materials; -dielectrics by reactive sputtering; -dielectric materials by high-frequency magnetron sputtering. Other methods of thin film deposition are: -thermal evaporation using a resistive evaporator; -thermal evaporation using electron heating (ring cathode); -ion-beam sputtering The units provide: stabilisation of the set flow rate of process gases on three channels and control of gas flow rate on each channel; automatic execution of programmes "from loading to unloading". The units can be equipped with a set of technological devices: magnetrons, ion sources, thermal vaporisers, ion sputtering devices and heaters. The technology can be tested and subsequently transferred It can be transferred to the ordered installation under the Customer's technology.

Specifications

Width
1850 mm
Length
1450 mm
Height
2550 mm
Diameter of substrate
150 mm
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Delivery & Payment

Shipping Terms

FOB Novorossiysk, RussiaCIF Available to major ports worldwideEXW Manufacturer's facility, Russia

Delivery Time

Sea freight: 30-60 days (depending on destination) Air freight: 14-21 days (for urgent orders)

Payment Methods

Letter of Credit (L/C)Wire Transfer (T/T)Escrow Services

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